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《硅表面及界面的形成(英文版)》内容简介：Silicon is the material of choice of the multibillion semiconductor industry. Ongoing miniaturization of microelectronic devices drives critical regi*** of integrated circuits ever closer to the place where the silicon ends and another material begins, to the interracial region. Performance and reliability of electronic microelements depend more and more on the microscopic quality of the interfaces and on the microscopic-scale quality of the original Si surfaces. Suffice to say that as soon as in the first decade of the coming millenium the customers will be offered microelectronic chips with minimum features about hundred atoms long and a couple of atoms thick! Small wonder that atomic-scale knowledge is gaining a commercial value.

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《硅表面及界面的形成(英文版)》内容简介：Silicon is the material of choice of the multibillion semiconductor industry. Ongoing miniaturization of microelectronic devices drives critical regi*** of integrated circuits ever closer to the place where the silicon ends and another material begins, to the interracial region. Performance and reliability of electronic microelements depend more and more on the microscopic quality of the interfaces and on the microscopic-scale quality of the original Si surfaces. Suffice to say that as soon as in the first decade of the coming millenium the customers will be offered microelectronic chips with minimum features about hundred atoms long and a couple of atoms thick! Small wonder that atomic-scale knowledge is gaining a commercial value.